Next gen initiative

Apply to the NEXT GEN INITIATIVE 2026

CALL FOR APPLICATIONS | NEXT GEN INITIATIVE 2026

The Ellen Johnson Sirleaf Presidential Center for Women and Development is inviting applications for the inaugural cohort of its Next Gen Initiative, a flagship 12-month leadership fellowship designed to support emerging African women leaders.

The program is designed to equip promising young women with the exposure, experience, mentorship and support needed to advance their leadership journeys and contribute meaningfully to public service and social development.

PROGRAM HIGHLIGHTS

During the 12-month fellowship, selected participants will engage in:

• Leadership development
• Mentorship and coaching
• Immersive learning experiences
• Hands-on public leadership placements alongside Amujae Leaders
• Professional networking and peer learning
• Practical exposure to public leadership

Fellows will have the opportunity to strengthen their leadership capabilities, expand their professional networks and develop the skills and perspectives needed to drive meaningful change in their communities, countries and across Africa.

CANDIDATE PROFILE

Applicants must:

• Be 25–35 years old as of 1st October 2026
• Hold an undergraduate degree
• Have at least 3 years of relevant and consistent professional experience in public policy, law, development, gender, health, governance or a related field
• Demonstrate strong leadership potential, integrity and commitment to public service and social impact
• Show a clear interest in developing their leadership trajectory
• Demonstrate a commitment to contributing to positive change in their country and across Africa

ELIGIBLE COUNTRIES

The inaugural cohort is open to citizens of:

• Kenya
• Lesotho
• Liberia
• Nigeria
• Sierra Leone

FELLOWSHIP SUPPORT

Selected fellows will receive a reasonable monthly stipend throughout the 12-month fellowship to support their participation in the program.

HOW TO APPLY

Interested and eligible candidates should complete the online application form:

Apply Here

 

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